The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2019

Filed:

Aug. 11, 2016
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Hucheng Lee, Cupertino, CA (US);

Govindarajan Thattaisundaram, San Jose, CA (US);

Assignee:

KLA-Tencor Corp., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); G06T 7/00 (2017.01); H01L 21/66 (2006.01); G06T 7/73 (2017.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G06T 7/0006 (2013.01); G06T 7/0008 (2013.01); G06T 7/74 (2017.01); H01L 22/12 (2013.01); H01L 22/20 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/2817 (2013.01);
Abstract

Methods and systems for determining a position of a defect in an electron beam image of a wafer are provided. One method includes determining a second position of a defect with respect to patterns imaged in a test image based on a first position of the defect in a difference image. The method also includes determining a third position of the defect with respect to the patterns in an electron beam image for the defect and determining an association between the first and third positions. In addition, the method includes determining a position of another defect in an electron beam image based on a first position of the other defect in a difference image and the determined association.


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