The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2019

Filed:

Jul. 08, 2014
Applicant:

Nova Measuring Instruments Ltd., Rehovot, IL;

Inventors:

Gilad Barak, Rehovot, IL;

Shay Wolfling, Kiryat Ono, IL;

Cornel Bozdog, San Jose, CA (US);

Matthew Sendelbach, Fishkill, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G01N 23/20 (2018.01); G01L 1/24 (2006.01);
U.S. Cl.
CPC ...
G01N 23/20 (2013.01); G01L 1/24 (2013.01); G01N 2223/607 (2013.01); G01N 2223/611 (2013.01);
Abstract

A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.


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