The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2019

Filed:

Feb. 14, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Yung-Chen Lin, Los Angeles, CA (US);

Qingjun Zhou, San Jose, CA (US);

Xinyu Bao, Fremont, CA (US);

Ying Zhang, Santa Clara, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/22 (2006.01); H01L 21/38 (2006.01); H01L 21/033 (2006.01); H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); H01L 21/0332 (2013.01); H01L 21/823431 (2013.01);
Abstract

Embodiments described herein relate to substrate processing methods. The methods include forming a patterned hardmask material on a substrate, forming first mandrel structures on exposed regions of the substrate, and depositing a gap fill material on the substrate over the hardmask material and the first mandrel structures. The first mandrel structures are removed to expose second region of the substrate form second mandrel structures comprising the hardmask material and the gap fill material and fin structures are deposited on the substrate using the second mandrel structures as a mask.


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