The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Jul. 06, 2017
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Teng-Chuan Hu, Tainan, TW;

Chun-Hung Chen, Tainan, TW;

Chu-Fu Lin, Kaohsiung, TW;

Chun-Ting Yeh, Taipei, TW;

Chung-Hsing Kuo, Taipei, TW;

Ming-Tse Lin, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 23/00 (2006.01); H01L 23/48 (2006.01); H01L 23/528 (2006.01); H01L 21/768 (2006.01); H01L 23/532 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
H01L 23/481 (2013.01); H01L 21/7684 (2013.01); H01L 21/7685 (2013.01); H01L 21/76831 (2013.01); H01L 21/76898 (2013.01); H01L 23/528 (2013.01); H01L 23/53238 (2013.01); H01L 21/3212 (2013.01);
Abstract

A semiconductor structure includes a substrate having a frontside surface and a backside surface. A through-substrate via extends into the substrate from the frontside surface. The through-substrate via comprises a top surface. A metal cap covers the top surface of the through-substrate via. A plurality of cylindrical dielectric plugs is embedded in the metal cap. The cylindrical dielectric plugs are distributed only within a central area of the metal cap. The central area is not greater than a surface area of the top surface of the through-substrate via.


Find Patent Forward Citations

Loading…