The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2019

Filed:

Mar. 04, 2016
Applicant:

Cadence Design Systems, Inc., San Jose, CA (US);

Inventors:

Sameer Chakravarthy Chillarige, Uttar Pradesh, IN;

Sharjinder Singh, Delhi, IN;

Anil Malik, Delhi, IN;

Joseph Michael Swenton, Owego, NY (US);

Assignee:

Cadence Design Systems, Inc., San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/317 (2006.01); G01R 31/3177 (2006.01); G06F 17/50 (2006.01); G01R 31/00 (2006.01); G01R 31/311 (2006.01);
U.S. Cl.
CPC ...
G01R 31/31704 (2013.01); G01R 31/3177 (2013.01); G01R 31/00 (2013.01); G01R 31/311 (2013.01); G06F 17/50 (2013.01); G06F 17/5022 (2013.01); G06F 17/5045 (2013.01);
Abstract

The present disclosure relates to a system and method for performing scan chain diagnosis of an electronic design. The method may include identifying, at a computing device, at least one failing scan chain associated with the electronic design. The method may also include selecting a plurality of defect locations associated with the at least one failing scan chain, wherein the plurality of defect locations corresponds to a number of parallel patterns that a simulator is configured to process. The method may further include selecting a sliced failing pattern set and generating a plurality of copies of a pattern associated with the sliced failing pattern set, wherein each of the plurality of copies corresponds to one of the plurality of defect locations. The method may also include simulating the plurality of copies of the pattern in parallel.


Find Patent Forward Citations

Loading…