The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2018
Filed:
Aug. 05, 2016
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Wei-Cheng Lin, Taichung, TW;
Kam-Tou Sio, Hsinchu County, TW;
Shih-Wei Peng, Hsinchu, TW;
Hui-Ting Yang′, Hsinchu County, TW;
Chih-Liang Chen, Hsinchu, TW;
Jiann-Tyng Tzeng, Hsin Chu, TW;
Chew-Yuen Young, Cupertino, CA (US);
Chia-Tien Wu, Taichung, TW;
Chih-Ming Lai, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Abstract
A method performed by at least one processor comprises the operations of obtaining information on gate pitch and a ratio m:n between gate pitch and metal line pitch, m, n being a natural number and the ratio being in the simplest form, determining a unit pattern having a width of n times of the gate pitch, assigning m consecutive metal lines to the unit pattern, dividing the width of the unit pattern by m and obtaining a quotient (Q) and a remainder (R), determining an integer P so that a value of the remainder R divided by P satisfies a layout precision, and determining an inter-pattern metal line pitch and an intra-pattern metal line pitch based on Q and R/P.