The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Aug. 08, 2017
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Noam Sapiens, Cupertino, CA (US);
Andrei V. Shchegrov, Campbell, CA (US);
Stilian Ivanov Pandev, Santa Clara, CA (US);
Assignee:
KLA—Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/93 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); G01N 21/47 (2006.01);
U.S. Cl.
CPC ...
G01N 21/93 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G01B 2210/56 (2013.01); G01N 21/4788 (2013.01); G01N 2201/062 (2013.01); G01N 2201/06113 (2013.01); G01N 2201/10 (2013.01); G01N 2201/1296 (2013.01);
Abstract
In one embodiment, apparatus and methods for determining a parameter of a target are disclosed. A target having an imaging structure and a scatterometry structure is provided. An image of the imaging structure is obtained with an imaging channel of a metrology tool. A scatterometry signal is also obtained from the scatterometry structure with a scatterometry channel of the metrology tool. At least one parameter, such as overlay error, of the target is determined based on both the image and the scatterometry signal.