The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2018

Filed:

Dec. 21, 2016
Applicants:

Asml Netherlands B.v., Veldhoven, NL;

Asml Holding N.v., Veldhoven, NL;

Inventors:

Yevgeniy Konstantinovich Shmarev, Lagrangeville, NY (US);

Stanislav Smirnov, Danbury, CT (US);

Chien-Hung Tseng, Wilton, CT (US);

Armand Eugene Albert Koolen, Nuth, NL;

Assignees:

ASML NETHERLANDS B.V., Veldhoven, NL;

ASML HOLDING N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/26 (2006.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8806 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G03F 7/70625 (2013.01); G03F 7/70641 (2013.01); G01N 2021/8822 (2013.01); G01N 2021/95676 (2013.01); G01N 2201/0638 (2013.01);
Abstract

An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.


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