The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2018
Filed:
Dec. 04, 2012
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Chuanyong Huang, Milpitas, CA (US);
Raymond Chu, Cupertino, CA (US);
Gordana Neskovic, Santa Clara, CA (US);
Dieter Wilk, San Jose, CA (US);
Christian Wolters, San Jose, CA (US);
Tim Mahatdejkul, Fremont, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01); G01N 21/00 (2006.01); G01N 21/47 (2006.01); G01D 18/00 (2006.01);
U.S. Cl.
CPC ...
G01D 18/008 (2013.01);
Abstract
The present disclosure is directed to a method for designing an aperture in a mask for inspecting a wafer. The method includes the steps of scanning a collection plane of the wafer at a plurality of points and collecting data for at least a part of the wafer. The method also includes the step of mapping the data. A further step of the method includes configuring the aperture based on the mapped data.