The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2018
Filed:
Jan. 17, 2018
Applicant:
Intel Corporation, Santa Clara, CA (US);
Inventors:
Yan A. Borodovsky, Portland, OR (US);
Donald W. Nelson, Beaverton, OR (US);
Mark C. Phillips, Portland, OR (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/20 (2012.01); G03F 7/20 (2006.01); H01J 37/30 (2006.01); H01L 21/768 (2006.01); H01J 37/317 (2006.01); H01J 37/302 (2006.01); H01J 37/04 (2006.01);
U.S. Cl.
CPC ...
G03F 1/20 (2013.01); G03F 7/203 (2013.01); H01J 37/045 (2013.01); H01J 37/3026 (2013.01); H01J 37/3177 (2013.01); H01L 21/76802 (2013.01); H01J 2237/0435 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/303 (2013.01); H01J 2237/30422 (2013.01); H01J 2237/30438 (2013.01); H01J 2237/31762 (2013.01); H01J 2237/31764 (2013.01);
Abstract
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA includes three distinct aperture arrays of different pitch.