The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Mar. 07, 2017
Asml Netherlands B.v., Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Marcel Beckers, Eindhoven, NL;
Marco Polizzi, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Anthonie Kuijper, Best, NL;
Koen Steffens, Veldhoven, NL;
Adrianes Johannes Baeten, Eindhoven, NL;
Anca Mihaela Antonevici, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile