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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10007179 B1

PDFFull Text
Date of Patent:
Jun. 26, 2018

Filed:

Oct. 19, 2016

Thermal acid generators and photoresist pattern trimming compositions and methods

Applicant:

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

Irvinder Kaur, Northborough, MA (US);

Cong Liu, Shrewsbury, MA (US);

Kevin Rowell, Brighton, MA (US);

Gerhard Pohlers, Needham, MA (US);

Mingqi Li, Shrewsbury, MA (US);

Assignee:

Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);

Attorney:

Jonathan D. Baskin

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/004 (2006.01); C07D 213/61 (2006.01); C07D 239/26 (2006.01); C07C 309/58 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); G03F 7/38 (2006.01); C07C 309/01 (2006.01); C07C 309/33 (2006.01); C07C 309/39 (2006.01); C07C 309/40 (2006.01); C07C 309/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/58 (2013.01); C07D 213/61 (2013.01); C07D 239/26 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2022 (2013.01); G03F 7/327 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); C07C 309/01 (2013.01); C07C 309/28 (2013.01); C07C 309/33 (2013.01); C07C 309/39 (2013.01); C07C 309/40 (2013.01); C07C 2603/74 (2017.05);
Abstract

Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices.

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