The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2018

Filed:

Jun. 08, 2016
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ruqiang Bao, Niskayuna, NY (US);

Siddarth A. Krishnan, Newark, CA (US);

Unoh Kwon, Fishkill, NY (US);

Vijay Narayanan, New York, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/49 (2006.01); H01L 21/306 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4966 (2013.01); H01L 21/30608 (2013.01); H01L 29/66795 (2013.01); H01L 29/785 (2013.01);
Abstract

Semiconductor devices and methods of forming the same include forming a work function stack over semiconductor fins in a first region and a second region, the work function stack having a bottom layer, a middle layer, and a top layer. The work function stack is etched to remove the top layer and to decrease a thickness of the middle layer in the second region, leaving a portion of the middle layer and the bottom layer intact. A gate is formed over the semiconductor fins in the first and second regions.


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