This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Zhejiang Konita New Materials Co., Ltd.. Active years: 2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022
Title: Zuoting Ying: Innovator in Lithography Technology
Introduction
Zuoting Ying is a notable inventor based in Zhejiang, China. He has made significant contributions to the field of lithography through his innovative patent. His work focuses on improving the efficiency and performance of printing plates, which are essential in various printing applications.
Latest Patents
Zuoting Ying holds a patent for an "Imageable coating layer, thermal negative-working lithography printing plate, and platemaking method therefor." This invention relates to a specialized coating layer that includes several constituents in specific parts by weight. The components include a radically polymerizable compound (20-60 parts), a radiation-absorbing compound (0.5-12 parts), a free radical initiator (1-25 parts), a binding agent (10-70 parts), and a development accelerator (0.5-15 parts). The platemaking method involves preparing a printing plate precursor, patternedly exposing it, and removing the unexposed area through a development process. This innovative approach allows for flexible development processes, enhancing the printing performance of the plates.
Career Highlights
Zuoting Ying is associated with Zhejiang Konita New Materials Co., Ltd., where he applies his expertise in developing advanced materials for lithography. His work has positioned him as a key player in the field, contributing to the advancement of printing technologies.
Collaborations
Zuoting Ying collaborates with talented individuals such as Ting Tao and Nganhau Yung. Their combined efforts contribute to the innovative environment at Zhejiang Konita New Materials Co., Ltd.
Conclusion
Zuoting Ying's contributions to lithography technology through his patent demonstrate his commitment to innovation in the field. His work not only enhances printing performance but also showcases the potential for further advancements in material science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile