Company Filing History:
Years Active: 2019
Title: The Innovative Contributions of Zuleykhan Tomova
Introduction
Zuleykhan Tomova, a notable inventor based in Greenbelt, Maryland, has made significant strides in the field of photolithography. With one patented invention to his name, he is contributing to advancements in material science and technology.
Latest Patents
Zuleykhan's notable patent, titled "Multicolor Photolithography Materials and Methods," introduces innovative photoresist compositions. This invention features a base resin capable of radical polymerization activated by photoinitiation. The method involves exposing photoinitiator molecules, such as diketones, to multiple radiation sources in a sequence that allows for precise control over the polymerization process. This enables the creation of complex multicolor patterns, pushing the boundaries of traditional photolithography techniques.
Career Highlights
Tomova's career is anchored at the University System of Maryland, where he continues to deepen his research and development efforts. His role allows him to explore and implement innovative concepts that enhance photolithography applications, aligning with the advanced technological goals of the institution.
Collaborations
Throughout his career, Zuleykhan has collaborated with esteemed colleagues, including John T. Fourkas and Daniel E. Falvey. These partnerships have been instrumental in enhancing his research endeavors and in advancing projects that explore the potentials of photolithography.
Conclusion
Zuleykhan Tomova exemplifies the spirit of innovation in the realm of photolithography with his patent on multicolor photolithography materials and methods. Through his work at the University System of Maryland and collaborations with renowned researchers, he continues to contribute valuable advancements that shape the future of materials science.