Hangzhou, China

Zuanyu Chen

This inventor holds 1 USPTO granted patent. Top assignee: Hangzhou Normal University. Active years: 2026.


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Zuanyu Chen - Innovator in Silicone Rubber Foam Technology.

Introduction

Zuanyu Chen is a notable inventor based in Hangzhou, China. He has made significant contributions to the field of materials science, particularly in the development of silicone rubber foams. His innovative work focuses on enhancing the properties of silicone rubber for various applications.

Latest Patents

Zuanyu Chen holds a patent for a silicone rubber foam with ablation resistance and high-efficiency heat insulation. The patent describes a preparation method that involves the use of hydroxyl-terminated polydimethylsiloxane, vinyl-terminated polydimethylsiloxane, and other specialized materials. This room-temperature-vulcanizing (RTV) silicone rubber foam is designed to withstand extreme conditions while providing effective thermal insulation. The patent showcases his expertise in combining various components to achieve superior performance in silicone rubber products. He has 1 patent to his name.

Career Highlights

Zuanyu Chen is affiliated with Hangzhou Normal University, where he continues to engage in research and development. His work has garnered attention for its practical applications in industries requiring advanced materials. His innovative approach to silicone rubber technology has positioned him as a key figure in this field.

Collaborations

Zuanyu Chen has collaborated with notable colleagues, including Longcheng Tang and Guodong Zhang. These partnerships have contributed to the advancement of research in silicone materials and their applications.

Conclusion

Zuanyu Chen's contributions to silicone rubber foam technology exemplify the importance of innovation in materials science. His patent reflects a commitment to developing high-performance materials that meet the demands of modern applications. His work continues to inspire advancements in the field.

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