This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: **Zoran Dragojlovic: Innovator in Doped Silicon Deposition Processes**
Introduction
Zoran Dragojlovic is a notable inventor based in San Jose, California, recognized for his contributions to materials science and semiconductor technology. With a strong focus on the process of depositing doped silicon film, he has made impactful advancements that benefit the field of microelectronics.
Latest Patents
Zoran Dragojlovic holds a patent for a revolutionary method titled "Doped Silicon Deposition Process in Resistively Heated Single Wafer Chamber." This invention outlines a sophisticated approach to depositing doped polycrystalline or amorphous silicon film. The method involves placing a substrate onto a specially designed susceptor that features a resistive heater and a thermocouple for precise temperature control. By heating the susceptor and introducing a mix of process gases, which includes a silicon source gas, a dopant gas, and nitrogen as the carrier gas, Dragojlovic's method successfully produces a high-quality doped silicon film.
Career Highlights
Zoran Dragojlovic is currently employed with Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment industry. Throughout his career, he has dedicated himself to enhancing semiconductor processing techniques, contributing to significant advancements in the fabrication of microelectronic devices.
Collaborations
At Applied Materials, Zoran has had the opportunity to collaborate with esteemed colleagues, including Shulin Wang and Lee Luo. These collaborations exemplify the innovative environment at the company, where teamwork plays a crucial role in developing cutting-edge technologies.
Conclusion
Zoran Dragojlovic's work exemplifies the spirit of innovation in the semiconductor industry. His patented method for doped silicon deposition not only highlights his technical expertise but also signifies the ongoing evolution of microelectronic manufacturing processes. As advancements continue, Dragojlovic's contributions stand as a testament to the vital role of inventors in driving technological progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
