Newtown, PA, United States of America

Zino Altman

USPTO Granted Patents = 2 



Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2003-2009

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2 patents (USPTO):Explore Patents

Title: Zino Altman: Innovator in Optical Measurement Technologies

Introduction

Zino Altman is a notable inventor based in Newtown, PA, who has made significant contributions to the field of optical measurement technologies. With a total of 2 patents, Altman has developed innovative methods and systems that enhance the precision of optical surface measurements.

Latest Patents

Altman's latest patents include a "Method and system for measuring the curvature of an optical surface." This invention operates by illuminating the object's surface with a light pattern of known size, producing a virtual reflected image. The system measures the size of this virtual image and calculates the curvature of the object surface based on the known size of the light pattern. Another significant patent is the "Method, system and product for producing a reflective mask mirror and for ablating an object using said reflective mask mirror." This invention involves a system for ablating a work-piece surface using a radiation source and adjustable reflective masks that direct an ablating beam onto the work-piece.

Career Highlights

Throughout his career, Zino Altman has worked with several companies, including Westar Photonics Inc. and Amo Wavefront Sciences, LLC. His experience in these organizations has allowed him to refine his skills and contribute to advancements in optical technologies.

Collaborations

Altman has collaborated with notable professionals in his field, including Edward Polkowski and Jay J Brandinger. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Zino Altman is a distinguished inventor whose work in optical measurement technologies has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to enhancing precision in optical applications.

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