Company Filing History:
Years Active: 2020
Title: The Innovative Contributions of Zin Ma Shwe
Introduction
Zin Ma Shwe is a prominent inventor based in Singapore, known for her significant contributions to the field of materials science. With a focus on developing advanced barrier films, she has made strides in enhancing the performance and durability of various devices.
Latest Patents
Zin Ma Shwe holds a patent for an "Inorganic graded barrier film and methods for their manufacture." This invention refers to a graded barrier film comprising a layered structure. The layered structure includes a first layer consisting of metal oxide, an intermediate layer consisting of metal nitride or metal oxynitride arranged on the first layer, and a third layer consisting of a metal oxide arranged on the intermediate layer. Additionally, the invention encompasses a sputtering method for manufacturing this graded barrier film and a device encapsulated with it. Zin Ma Shwe has 1 patent to her name.
Career Highlights
Zin Ma Shwe is affiliated with the Agency for Science, Technology and Research, where she applies her expertise in materials science to drive innovation. Her work has been instrumental in advancing the development of barrier films that are crucial for various applications.
Collaborations
Zin Ma Shwe collaborates with her coworker, Senthil Kumar Ramadas, to further enhance their research and development efforts in the field of materials science.
Conclusion
Zin Ma Shwe's innovative work in developing inorganic graded barrier films showcases her dedication to advancing technology. Her contributions are paving the way for improved device performance and durability in various applications.