Zihao Ding

Title: Innovations of Zihao Ding in Etching Technology

Introduction

Zihao Ding is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of etching technology, particularly in the semiconductor industry. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of etching processes.

Latest Patents

Zihao Ding holds a patent titled "Bias voltage modulation approach for SiO/SiN layer alternating etch process." This patent describes a method for etching a film stack with high selectivity and low etch recipe transition periods. The method involves transferring a substrate with a film stack into a processing chamber, applying a first bias voltage to the substrate, and etching an oxide layer while maintaining this voltage. Subsequently, a second bias voltage, greater than the first, is applied to etch a nitride layer of the film stack.

Career Highlights

Zihao Ding is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing innovative etching techniques that improve manufacturing processes. His expertise in this area has positioned him as a valuable asset to his team and the company.

Collaborations

Zihao has collaborated with several talented individuals in his field, including Sean S Kang and Olivier Luere. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Zihao Ding's contributions to etching technology exemplify the impact of innovation in the semiconductor industry. His patent and work at Applied Materials, Inc. highlight his commitment to advancing manufacturing processes. His collaborations further enhance the potential for future breakthroughs in this critical field.