Taipei, Taiwan

Zih-I Chuang

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Chang Chun Plastics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zih-I Chuang. Retrieved from https://idiyas.com/inventor/zih-i-chuang-plmixzon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Zih-I Chuang and Photosensitive Resin Innovation.

Introduction

Zih-I Chuang is an inventor based in Taipei, Taiwan. His patent work includes a photosensitive resin film and its application, addressing the film’s thermal behavior under specified testing conditions.

Latest Patents

Chuang is associated with 1 patent: “Photosensitive Resin Film and Application Thereof.” The invention describes a photosensitive resin film whose weight-loss behavior is characterized through thermogravimetric analysis. The test heats the film from 40°C to 200°C at 5°C per minute, then holds it at 200°C for 10 minutes. Within the 0-to-40-minute interval, the absolute value of the first derivative of weight percentage with respect to time is greater than 0.1% per minute and no more than 1.0% per minute.

Career Highlights

Chuang is associated with Chang Chun Plastics Co., Ltd. His patent reflects work on photosensitive resin materials and their thermal properties.

Collaborations

The available information associates Chuang’s patent with Chang Chun Plastics Co., Ltd., but does not specify additional collaborators or research partners.

Conclusion

Zih-I Chuang’s patent focuses on defining the thermal behavior of a photosensitive resin film, connecting his work in Taipei with materials innovation at Chang Chun Plastics Co., Ltd.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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