Ziang Wang

Title: Ziang Wang: Innovator in Photoetching Technology

Introduction

Ziang Wang is a prominent inventor based in Hangzhou, China. He is known for his innovative contributions to the field of photoetching technology. With a focus on high-speed laser applications, Wang has developed methods that enhance the efficiency and precision of photoetching processes.

Latest Patents

Wang holds a patent for a "Method and apparatus for direct writing photoetching by parallel interpenetrating super-resolution high-speed laser." This invention utilizes a parallel interpenetrating algorithm to generate a multi-beam solid light spot for writing, combined with a multi-beam hollow light spot for inhibition. The process involves outputting a writing waveform and moving a displacement stage at a constant speed until the entire column of areas is written. This innovative approach allows for high-speed and precise photoetching.

Career Highlights

Throughout his career, Ziang Wang has worked with notable institutions such as Zhejiang Lab and Zhejiang University. His experience in these organizations has contributed significantly to his expertise in laser technology and photoetching methods.

Collaborations

Wang has collaborated with esteemed colleagues, including Cuifang Kuang and Hongqing Wang. These partnerships have fostered advancements in their respective fields and have led to innovative solutions in photoetching technology.

Conclusion

Ziang Wang's contributions to the field of photoetching through his patented methods demonstrate his commitment to innovation and excellence. His work continues to influence advancements in laser technology and its applications.