Ibaraki, Japan

Zhou Otto

This inventor holds 1 USPTO granted patent. Top assignee: Nec Corporation. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhou Otto. Retrieved from https://idiyas.com/inventor/zhou-otto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Zhou Otto - Innovator in Clathrate Compounds

Introduction

Zhou Otto is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of clathrate compounds. His innovative work has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Zhou Otto holds a patent for "Clathrate compounds and processes for production thereof." This patent describes a silicon clathrate compound with a specific composition, highlighting his focus on advancing material technologies. The patent reflects his commitment to innovation and the potential applications of clathrate compounds in various industries.

Career Highlights

Zhou Otto is currently employed at NEC Corporation, where he continues to push the boundaries of research and development. His role at NEC Corporation allows him to collaborate with other talented professionals and contribute to cutting-edge projects. His work has garnered attention for its potential impact on technology and materials.

Collaborations

Throughout his career, Zhou has worked alongside notable colleagues, including Katsumi Tanigaki and Sadanori Kuroshima. These collaborations have enriched his research and fostered a dynamic environment for innovation.

Conclusion

Zhou Otto is a dedicated inventor whose work in clathrate compounds exemplifies the spirit of innovation. His contributions to NEC Corporation and the field of materials science are noteworthy and continue to inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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