Zhou Mei Sheng

Title: Innovations of Zhou Mei Sheng in Semiconductor Manufacturing

Introduction

Zhou Mei Sheng is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. He holds two patents that showcase his innovative approaches to improving processes within the industry. His work focuses on enhancing the efficiency and safety of semiconductor fabrication.

Latest Patents

Zhou's latest patents include a method for toxic residual gas removal by non-reactive ion sputtering. This novel technique addresses the challenge of removing residual toxic gases trapped during the polymerizing process. By utilizing an inert ion sputter, a masking layer is formed over a semiconductor substrate, allowing for the effective desorption of toxic gas reactants. This method is crucial for ensuring the integrity of integrated circuit devices.

Another significant patent is his method to protect chamber walls from etching by endpoint plasma cleaning. This innovative approach involves measuring light emissions caused by particles within the plasma of the etch chamber. The cleaning process is initiated when contaminant levels are deemed too high, and it is considered complete once the light intensity from existing particles drops by a specified percentage. This method enhances the longevity and performance of etch chambers.

Career Highlights

Zhou Mei Sheng is currently employed at Chartered Semiconductor Manufacturing Ltd, where he applies his expertise in semiconductor technology. His work has significantly impacted the efficiency of manufacturing processes, contributing to advancements in the industry.

Collaborations

Zhou collaborates with esteemed colleagues, including Zou Zheng and Qinghua Zhong, who share his commitment to innovation in semiconductor manufacturing.

Conclusion

Zhou Mei Sheng's contributions to semiconductor manufacturing through his patents demonstrate his dedication to improving industry standards. His innovative methods for gas removal and chamber cleaning are vital for the advancement of integrated circuit fabrication.