Santa Clara, CA, United States of America

Zhonghao Zhang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lam Research Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhonghao Zhang. Retrieved from https://idiyas.com/inventor/zhonghao-zhang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations of Zhonghao Zhang in Selective Atomic Layer Etching

Introduction

Zhonghao Zhang is a notable inventor based in Santa Clara, California. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of selective atomic layer etching. His innovative methods have the potential to enhance the efficiency and precision of etching processes in various applications.

Latest Patents

Zhonghao Zhang holds a patent for a method of selective atomic layer etching. This method involves selectively etching a dielectric layer with respect to an epitaxial layer or metal-based hardmask. The process consists of multiple cycles, each comprising a deposition phase and an activation phase. During the deposition phase, a gas mixture containing helium and a hydrofluorocarbon or fluorocarbon is flowed and transformed into a plasma to create a fluorinated polymer deposition. The activation phase involves the use of an ion bombardment gas, which is also converted into plasma to activate the fluorine from the polymer deposition, allowing for the etching of the dielectric layer.

Career Highlights

Zhonghao Zhang is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on developing advanced etching techniques that are crucial for the fabrication of integrated circuits. His expertise in this area has positioned him as a valuable asset to his team and the company.

Collaborations

Zhonghao has collaborated with several talented individuals in his field, including Chia-Chun Wang and Eric A Hudson. These collaborations have fostered an environment of innovation and have contributed to the advancement of technologies in semiconductor manufacturing.

Conclusion

Zhonghao Zhang's contributions to selective atomic layer etching exemplify the importance of innovation in the semiconductor industry. His patented methods not only enhance etching processes but also pave the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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