Company Filing History:
Years Active: 1996
Title: Innovations by Zhong-Wei Chen in Electron Beam Inspection Technology
Introduction
Zhong-Wei Chen is a notable inventor based in Palo Alto, California. He has made significant contributions to the field of charged particle scanning systems, particularly in the area of electron beam inspection technology. His innovative work has implications for microcircuit fabrication, enhancing the efficiency and accuracy of inspection processes.
Latest Patents
Zhong-Wei Chen holds a patent for an "Electron beam inspection system and method." This invention encompasses a method and apparatus for a charged particle scanning system and an automatic inspection system, which includes wafers and masks used in microcircuit fabrication. The system directs a charged particle beam at the surface of a substrate for scanning, utilizing a selection of detectors to detect secondary charged particles, back-scattered charged particles, and transmitted charged particles from the substrate. The substrate is mounted on an x-y stage, providing at least one degree of freedom during scanning. Additionally, the system subjects the substrate to an electric field to accelerate secondary charged particles, facilitating inspection at low beam energies on charge-sensitive insulating substrates. The invention also features an optical alignment system and a vacuum system for efficient operation.
Career Highlights
Zhong-Wei Chen is currently employed at Kla Instruments Corporation, where he continues to develop and refine technologies related to electron beam inspection. His work has positioned him as a key figure in advancing inspection methodologies in the semiconductor industry.
Collaborations
Zhong-Wei Chen has collaborated with notable colleagues, including Dan Meisberger and Alan D Brodie. These partnerships have contributed to the development of innovative solutions in the field of charged particle scanning systems.
Conclusion
Zhong-Wei Chen's contributions to electron beam inspection technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and ongoing work at Kla Instruments Corporation highlight the importance of advancements in inspection systems for microcircuit fabrication.