Beijing, China

Zhiying Fan

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhiying Fan. Retrieved from https://idiyas.com/inventor/zhiying-fan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Zhiying Fan: Innovator in Press-Fit Technology

Introduction

Zhiying Fan is a notable inventor based in Beijing, China. He has made significant contributions to the field of press-fit technology, particularly with his innovative apparatus designed for quality monitoring and guiding.

Latest Patents

Zhiying Fan holds a patent for a "Pre-screening, compliant pin guiding and quality monitoring press-fit apparatus." This invention includes a fixed plate, a movable plate, a printed circuit board (PCB), and a press-fit connector. The apparatus is designed to enhance the efficiency and accuracy of the press-fit process, ensuring that components are properly aligned and secured.

Career Highlights

Zhiying Fan is currently employed at International Business Machines Corporation (IBM). His work at IBM has allowed him to further develop his expertise in innovative technologies and contribute to the company's advancements in engineering solutions.

Collaborations

Zhiying has collaborated with several talented individuals, including Qiuyi Yu and Zhongfeng Yang. Their teamwork has fostered an environment of creativity and innovation, leading to the development of cutting-edge technologies.

Conclusion

Zhiying Fan's contributions to press-fit technology exemplify his dedication to innovation and quality. His patent and work at IBM highlight his role as a key player in advancing engineering solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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