Hubei, China

Zhiwei Yu

This inventor holds 1 USPTO granted patent. Top assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhiwei Yu. Retrieved from https://idiyas.com/inventor/zhiwei-yu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Zhiwei Yu - Innovator in Measuring Technology

Introduction

Zhiwei Yu is a prominent inventor based in Hubei, China. He has made significant contributions to the field of measuring technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and accuracy of measurement processes.

Latest Patents

Zhiwei Yu holds a patent for a "Multi-head measuring apparatus and measuring point automatic allocation method thereof." This invention provides a method for automatically allocating measuring point positions on a color filter's surface. The process involves obtaining point position coordinates, grouping them, and matching them with corresponding gantry mechanisms and measuring head mechanisms. This systematic approach ensures precise allocation of measurement points.

Career Highlights

Zhiwei Yu is associated with Wuhan China Star Optoelectronics Technology Co., Ltd., where he applies his expertise in measuring technology. His innovative solutions have contributed to advancements in the industry, showcasing his commitment to improving measurement techniques.

Collaborations

Zhiwei collaborates with talented coworkers, including Min Li and Min Qiu. Their combined efforts foster a creative environment that drives innovation and enhances the development of new technologies.

Conclusion

Zhiwei Yu's contributions to measuring technology exemplify the impact of innovation in enhancing measurement processes. His patent reflects a commitment to precision and efficiency in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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