Jiangsu, China

Zhiqiang Chu

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Focus Lightings Tech Co., Ltd. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhiqiang Chu. Retrieved from https://idiyas.com/inventor/zhiqiang-chu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Zhiqiang Chu: Innovator in LED Technology

Introduction

Zhiqiang Chu is a prominent inventor based in Jiangsu, China. He has made significant contributions to the field of LED technology, particularly in improving light extraction efficiency. His innovative approach has led to the development of a unique chip fabrication process that enhances the performance of LED chips.

Latest Patents

Zhiqiang Chu holds a patent for a "Chip fabrication process for improving LED chip light extraction efficiency with isolation groove and LED chip thereof." This patent describes a method that includes a patterned sapphire substrate and an LED chip epitaxial wafer. The design features an isolation groove that optimizes light extraction, which is crucial for enhancing the efficiency of LED chips.

Career Highlights

Zhiqiang Chu is associated with Focus Lightings Tech Co., Ltd., where he applies his expertise in LED technology. His work has been instrumental in advancing the company's product offerings and establishing its reputation in the industry.

Collaborations

Zhiqiang has collaborated with notable colleagues, including Xiaoxiong Lin and Yufei Cao. Their combined efforts have contributed to the innovative projects at Focus Lightings Tech Co., Ltd.

Conclusion

Zhiqiang Chu's contributions to LED technology through his patented innovations demonstrate his commitment to enhancing energy efficiency in lighting solutions. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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