This inventor holds 1 USPTO granted patent. Top assignees: Second Institute of Oceanography, Ministry of Natural Resources, Shanghai Jiao Tong University. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2024
Title: Innovations of Zhihua Mao in Ocean Exploration Technology
Introduction
Zhihua Mao is a notable inventor based in Hangzhou, China. He has made significant contributions to the field of ocean exploration technology. His innovative work focuses on enhancing the capabilities of lidar systems for real-time detection of subsurface information in marine environments.
Latest Patents
Zhihua Mao holds a patent for a "Dual-wavelength high-spectral resolution lidar system based on dual-stage virtual image phased array." This advanced system includes a dual-wavelength vertically polarized light emission system, multiple beam splitting systems, and various photodetectors. It is designed to detect subsurface information in oceans, including phytoplankton vertical layered structures and the vertical profile distribution of temperature and salinity of seawater. The system addresses existing challenges in ocean exploration technology and aims to contribute to the realization of a transparent ocean.
Career Highlights
Throughout his career, Zhihua Mao has worked with esteemed organizations such as the Second Institute of Oceanography, Ministry of Natural Resources, and Shanghai Jiao Tong University. His experience in these institutions has allowed him to develop and refine his innovative technologies.
Collaborations
Zhihua Mao has collaborated with notable colleagues, including Dapeng Yuan and Peng Chen. Their combined expertise has contributed to the advancement of ocean exploration technologies.
Conclusion
Zhihua Mao's contributions to ocean exploration through his innovative lidar system demonstrate his commitment to advancing marine science. His work not only addresses current technological challenges but also paves the way for future developments in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile