Company Filing History:
Years Active: 2007-2019
Title: Innovator Spotlight: Zhigang Mao, Revolutionizing Photomask Plasma Etching in San Jose, CA
Introduction:
Zhigang Mao, a brilliant inventor based in San Jose, CA, has made significant contributions to the field of photomask plasma etching with his innovative approach and patented methods. With a total of 3 patents under his name, Mao's work has reshaped the landscape of manufacturing photomasks for EUV applications and phase shift and binary photomask applications.
Latest Patents:
One of Mao's groundbreaking patents is the "Method for improving CD micro-loading in photomask plasma etching," where he presents novel techniques for etching a mask layer, specifically an absorber layer, in a film stack for photomask production. By utilizing a unique etching gas mixture and plasma formation process, Mao's method enhances the precision and efficiency of etching processes, ultimately improving CD micro-loading in photomask fabrication.
Career Highlights:
Zhigang Mao has garnered valuable experience and expertise during his tenure at renowned companies such as Applied Materials, Inc. and Lam Research Corporation. His innovative spirit and dedication to advancing semiconductor manufacturing technologies have propelled him to the forefront of the industry.
Collaborations:
Throughout his career, Zhigang Mao has collaborated with esteemed professionals in the field, including Xiaoyi Chen and Amitabh Sabharwal. Together, they have shared insights, ideas, and expertise to drive forward cutting-edge innovations in photomask technology.
Conclusion:
In conclusion, Zhigang Mao's inventive prowess and technical acumen have positioned him as a trailblazer in the realm of photomask plasma etching. His patents and contributions not only showcase his commitment to pushing boundaries but also underscore the importance of continuous innovation in advancing semiconductor manufacturing processes. Through his work, Mao has left an indelible mark on the industry and continues to inspire future generations of inventors and innovators.