San Diego, CA, United States of America

Zhibo Zhang

USPTO Granted Patents = 1 

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Zhibo Zhang

Introduction

Zhibo Zhang, based in San Diego, California, is a notable inventor recognized for his contributions to the field of semiconductor technology. With a focus on enhancing gate technology, Zhang has developed innovative methods that address challenges within the industry.

Latest Patents

Zhibo Zhang holds a patent for a breakthrough in dual metal gates, titled "Dual metal gates using one metal to alter work function of another metal." This patent proposes methods of forming dual metal gates, highlighting a process where a first metal layer (such as NMOS metal) is formed on a gate dielectric layer, followed by a second metal layer (e.g., PMOS metal) that modifies the work function of the first. The method includes steps to expose the first metal layer selectively and ensure that the gate dielectric layer remains undamaged, presenting a significant advancement in gate technology.

Career Highlights

Zhibo Zhang has made significant strides in his career while working at the International Business Machines Corporation (IBM). His innovative approach to semiconductor manufacturing and device engineering has not only advanced his expertise but has also positioned him as a key contributor in his field. Zhang’s achievements in patenting innovative methods underscore his dedication to research and development.

Collaborations

Throughout his career, Zhibo Zhang has collaborated with esteemed colleagues, including Byoung Hun Lee and Sang Ho Bae. Together, they have worked on advancing technologies that push the boundaries of semiconductor capabilities, reflecting a strong collaborative spirit and commitment to innovation.

Conclusion

Zhibo Zhang exemplifies the role of an inventor in the fast-paced world of technology. His patented methods for dual metal gates showcase not only his creativity but also his expertise in addressing industry challenges. With continued dedication and collaboration, Zhang is poised to make further significant contributions to the field of semiconductor technology.

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