Beijing, China

Zhenyuan Zhou

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Beijing Boe Display Technology Co., Ltd., Boe Technology Group Co., Ltd.. Active years: 2016.


 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Zhenyuan Zhou: Innovator in Mask-Mounting Technology

Introduction

Zhenyuan Zhou is a notable inventor based in Beijing, China. He has made significant contributions to the field of exposure machines, particularly with his innovative mask-mounting apparatus. His work has implications for the efficiency and reliability of exposure processes in various technological applications.

Latest Patents

Zhou holds a patent for a mask-mounting apparatus designed for exposure machines. This apparatus includes a mask frame for securing a mask, a gas cell positioned beneath the mask frame to support it, and a gas-supply unit that communicates with the gas cell through a gas-supply pipeline. A pneumatic switch valve is integrated into the gas-supply pipeline to prevent the gas cell from deflating in case of a supply interruption. This design ensures that the mask frame remains securely attached, mitigating risks associated with gas supply failures.

Career Highlights

Throughout his career, Zhenyuan Zhou has worked with prominent companies such as Beijing BOE Display Technology Co., Ltd. and BOE Technology Group Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in display technology.

Collaborations

Zhou has collaborated with talented individuals in his field, including Jintao Xiao and Run Chen. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Zhenyuan Zhou's contributions to the field of exposure machines through his innovative mask-mounting apparatus highlight his role as a significant inventor. His work not only enhances the functionality of exposure machines but also showcases the importance of collaboration in technological advancements.

Profile summary based on public USPTO records.
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