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Title: Zhenyao Yang: Innovator in Photoetching Technology
Introduction
Zhenyao Yang is a prominent inventor based in Hangzhou, China. He has made significant contributions to the field of photoetching technology, particularly through his innovative methods and apparatuses. His work has garnered attention for its potential applications in various industries.
Latest Patents
Zhenyao Yang holds a patent for a "Method and apparatus for direct writing photoetching by parallel interpenetrating super-resolution high-speed laser." This invention utilizes a parallel interpenetrating algorithm to enhance the efficiency and precision of photoetching processes. The method involves generating a multi-beam solid light spot for writing and a multi-beam hollow light spot for inhibition, which are then combined to create a modulated multi-beam light spot. The writing waveform is output through a multichannel acousto-optic modulator, allowing for continuous movement of the displacement stage until the entire column of areas is written.
Career Highlights
Throughout his career, Zhenyao Yang has worked with notable institutions such as Zhejiang Lab and Zhejiang University. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge research in the field of laser technology and photoetching.
Collaborations
Zhenyao has collaborated with esteemed colleagues, including Cuifang Kuang and Hongqing Wang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Zhenyao Yang's contributions to photoetching technology exemplify the spirit of innovation. His patented methods and collaborative efforts position him as a key figure in advancing this field. His work continues to inspire future developments in laser technology and its applications.