Portland, OR, United States of America

Zhenjiang Yu


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: **Zhenjiang Yu: Innovator in Semiconductor Surface Treatment**

Introduction

Zhenjiang Yu, based in Portland, OR, is a celebrated inventor with a patent focused on advancements in semiconductor technology. He is recognized for contributing to the field with a method that not only improves product quality but also enhances operational efficiency within the manufacturing processes.

Latest Patents

Yu holds a notable patent for a "Dielectric Anti-Reflective Coating Surface Treatment to Prevent Defect Generation in Associated Wet Clean." This innovation comprises a series of intricate steps aimed at preventing the formation of watermark defects during the cleaning process following semiconductor fabrication. The method involves forming multiple layers over a semiconductor substrate, including pad oxide, a silicon nitride layer, and a silicon oxynitride layer, subsequently utilizing these layers to create an anti-reflective coating.

Career Highlights

Zhenjiang Yu works at Integrated Device Technology, Inc., where he applies his expertise to advance semiconductor technologies. His work has contributed significantly to the enhancement of manufacturing protocols, helping to ensure product integrity and effectiveness in the ever-evolving technology landscape.

Collaborations

During his career, Yu has collaborated with esteemed colleagues such as Guo-Qiang Lo and Ohm-Guo Pan. These partnerships have played a crucial role in driving forward innovative solutions and methodologies in semiconductor processing and defect prevention, showcasing the strength of teamwork in achieving technological progress.

Conclusion

Zhenjiang Yu’s contributions to semiconductor technology through his patented innovations position him as a significant figure in the industry. His work at Integrated Device Technology, Inc. highlights the essential advancements being made in the field, particularly concerning the improvement of manufacturing processes and the reduction of defects in semiconductor devices.

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