Zhengyu Guo

Title: The Innovations of Zhengyu Guo

Introduction

Zhengyu Guo is a notable inventor based in Milpitas, California. He has made significant contributions to the field of photomask inspection technology. His work focuses on enhancing the accuracy and efficiency of optical height sensors in mask inspection tools.

Latest Patents

Zhengyu Guo holds a patent for the "Integration of an optical height sensor in mask inspection tools." This innovative photomask-inspection system includes a vacuum chamber and a stage that supports a photomask while allowing for horizontal and vertical translation. The system features an EUV objective to collect EUV light from the photomask for defect inspection. Additionally, it incorporates an optical height sensor to measure heights on the surface of the photomask, ensuring precise measurements for effective inspection.

Career Highlights

Zhengyu Guo is currently employed at Kla Corporation, where he continues to develop cutting-edge technologies in the field of photomask inspection. His expertise and innovative approach have positioned him as a key player in advancing the capabilities of inspection systems.

Collaborations

Zhengyu has collaborated with talented coworkers such as Zefram Marks and Dmitry Skvortsov. Their combined efforts contribute to the ongoing success and innovation at Kla Corporation.

Conclusion

Zhengyu Guo's contributions to photomask inspection technology exemplify the importance of innovation in the field. His patent and work at Kla Corporation highlight his commitment to advancing technology and improving inspection processes.