Zhejiang, China

Zhenghui Hu

This inventor holds 1 USPTO granted patent. Top assignee: Zhejiang University. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhenghui Hu. Retrieved from https://idiyas.com/inventor/zhenghui-hu-y81ueokk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Zhenghui Hu in Filament Measurement Technology.

Introduction

Zhenghui Hu is a notable inventor based in Zhejiang, China. He has made significant contributions to the field of optical measurement technology. His innovative approach focuses on the precise measurement of filament diameters using advanced techniques.

Latest Patents

Zhenghui Hu holds a patent titled "Method for measuring the diameter of filament diffraction fringes by calculating the frequency domain." This invention involves a systematic approach to measuring filament diameters through a diffraction optical path measurement system. The method captures diffraction fringe images and determines the optimal fringe range while considering noise from CCD sensitivity differences. Ultimately, it calculates the filament diameter using Fourier transform techniques, achieving measurement accuracy at the sub-nanometer level.

Career Highlights

Zhenghui Hu is affiliated with Zhejiang University, where he continues to advance research in optical measurement technologies. His work emphasizes the simplicity of calculations and the minimal dependence on experimental devices, showcasing the advantages of frequency domain measurements.

Collaborations

Zhenghui Hu has collaborated with notable colleagues, including Bin Wu and Yingpeng Zhao. Their joint efforts contribute to the ongoing development of innovative measurement techniques.

Conclusion

Zhenghui Hu's contributions to filament measurement technology highlight his expertise and innovative spirit. His patent demonstrates a significant advancement in the field, paving the way for more accurate and efficient measurement methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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