Zheng Zhou

Title: Innovations by Zheng Zhou in Semiconductor Technology

Introduction

Zheng Zhou is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. He has developed a significant patent that enhances the fabrication process of integrated circuit devices. His work is instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Zheng Zhou holds a patent titled "Method to form shallow trench isolations." This innovative method involves the formation of a pad oxide layer over a semiconductor substrate, followed by the deposition of a silicon nitride layer. A protective layer is then added, which is crucial for preventing the loss of the silicon nitride layer during the etching process. The method utilizes a large trench etching angle and ensures that the trenches are filled effectively, culminating in the successful manufacture of integrated circuit devices. He has 1 patent to his name.

Career Highlights

Zheng Zhou is currently employed at Chartered Semiconductor Manufacturing Ltd, where he applies his expertise in semiconductor fabrication. His work has contributed to the company's reputation as a leader in the semiconductor industry. His innovative approaches have paved the way for advancements in integrated circuit technology.

Collaborations

Zheng Zhou has collaborated with esteemed colleagues such as Subramanian Balakumar and Kong Hean Lee. Their combined efforts in the field of semiconductor technology have led to significant advancements and innovations.

Conclusion

Zheng Zhou's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work not only enhances manufacturing processes but also plays a vital role in the development of integrated circuit devices.