Zheng-Xian Wu

Title: Innovations by Zheng-Xian Wu in Semiconductor Technology

Introduction

Zheng-Xian Wu is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for forming semiconductor devices. His work has implications for the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Zheng-Xian Wu holds a patent titled "Methods for forming semiconductor devices." This patent outlines methods that include forming a trench in a substrate, where the trench features a defect protruding from its bottom surface. The methods further involve applying a flowable material on the substrate to partially cover the defect, performing an etching process to reduce the height of the defect, and subsequently removing the flowable material. This innovative approach enhances the fabrication of semiconductor devices.

Career Highlights

Zheng-Xian Wu is currently employed at Vanguard International Semiconductor Corporation, where he continues to advance semiconductor technology. His expertise and innovative mindset have positioned him as a valuable asset in the industry.

Collaborations

Zheng-Xian Wu has collaborated with notable colleagues, including I-Ping Lee and Kwang-Ming Lin. These collaborations have fostered a productive environment for innovation and development in semiconductor technologies.

Conclusion

Zheng-Xian Wu's contributions to semiconductor technology through his patent and work at Vanguard International Semiconductor Corporation highlight his role as an influential inventor in the field. His innovative methods are paving the way for advancements in semiconductor device manufacturing.