Location History:
- Los Angeles, CA (US) (2019)
- Emeryville, CA (US) (2014 - 2021)
Company Filing History:
Years Active: 2014-2025
Title: The Innovations of Zheng Gu
Introduction
Zheng Gu is a prominent inventor based in Emeryville, CA, known for his contributions to the field of lithography systems. With a total of 4 patents to his name, he has made significant advancements in digital lithography and imaging technologies. His work has been instrumental in enhancing the precision and efficiency of lithography processes.
Latest Patents
Zheng Gu's latest patents include groundbreaking technologies that improve maskless lithography systems. One of his notable inventions is a process, system, and software for maskless lithography systems. This innovation utilizes digital lithography patterning controlled by field programmable gate arrays (FPGA). The system processes substrates by receiving stage position data from the lithography environment, which is then loaded into memory for further processing. A graphics processing unit reads this data and calculates instructions for substrate processing.
Another significant patent focuses on real-time autofocus for maskless lithography on substrates. This invention enhances the imaging apparatus by pre-processing image data received from laser beams and sensors. The system effectively filters noise from metallic materials present on the substrate, allowing for accurate autofocus during exposure. By calculating centroids and focus deviations, the imaging system can adjust the stage and exposure source to achieve optimal results.
Career Highlights
Zheng Gu has had a distinguished career, working with esteemed organizations such as the University of California and Applied Materials, Inc. His experience in these institutions has allowed him to collaborate on various innovative projects and contribute to advancements in lithography technology.
Collaborations
Throughout his career, Zheng Gu has worked alongside talented individuals, including Arion-Xenofon Hadjioannou and David Prout. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in the field.
Conclusion
Zheng Gu's contributions to the field of lithography systems exemplify the impact of innovation on technology. His patents reflect a commitment to advancing the capabilities of digital lithography and imaging systems. Through his work, he continues to shape the future of this critical area in engineering and manufacturing.