University of California

Applied Materials, Inc.

Zheng Gu

Jeffrey Bokor

David Carlton

Arion-Xenofon Hadjioannou

Meenaradchagan Vishnu

Brian Lambson

Glen Alan Gomes

Yujiao Huang

Zhongchuan Zhang

Deepthy M George

Diana Valverde-Paniagua

Rendong Lin

David Prout

Embodiments of the systems, methods, and software provided herein patterns substrates using digital lithography patterning controlled by field programmable gate arrays (FPGA). Stage position data is provided to the FPGA from the lithography environment and the data is loaded into a memory from the FPGA. The graphics processing unit, reads the data from the memory and calculates instructions based on the data. At least a portion of a substrate disposed on the stage is processed using instructions provided by the FPGA.

Process, system, and software for maskless lithography systems

Embodiments of the systems and methods discussed herein autofocus an imaging apparatus by pre-processing image data received via channels of the imaging system that include laser beams and sensors configured to receive image data when laser beams are applied across a substrate in a pixel-wise application across a substrate. The substrate can include both a photoresist and metallic material, and the images as-received by the sensors include noise from the metallic material. During pre-processing of the image data, a percentage of noise to remove from the image data is determined, and the image data is filtered. A centroid of the substrate is calculated for each channel and a focus deviation for the exposure is determined. The centroids can be combined using one or more filtering mechanisms, and the imaging system can be autofocused in an exposure position by moving the stage and/or the exposure source in one or more directions.

Real-time autofocus for maskless lithography on substrates

High sensitivity and high spatial resolution detection modules are provided that that can be built into an array or incorporated into PET or other types of gamma ray detectors and imagers. Each detection module has a scintillation detector block, light detector and optional light guide. The detector block may be formed of a first scintillation layer material that has a fast decay constant and high light output (e.g. LYSO) and a second scintillation layer material with a slow decay constant and a lower light output (e.g. BGO) with a first layer to second layer array pitch ratio of approximately 2:3. Due to the large difference of light output and decay time of LYSO and BGO signals, three different types of events (LYSO, BGO and CLCS) can be identified with high accuracy.

Multiple spatial resolution scintillation detectors

A nanomagnet having widely tunable anisotropy is disclosed. The disclosed nanomagnet is a magnetic particle with a convex shape having a first magnetically easy axis. The convex shape is modified to include at least one concavity to urge a second magnetically easy axis to form substantially offset from the first magnetically easy axis. In at least one embodiment, the convex shape is also modified to include at least one concavity to urge a second magnetically easy axis to form with a magnetic strength substantially different from the first magnetically easy axis.

Concave nanomagnets with widely tunable anisotropy

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Emeryville, CA, United States of America

Zheng Gu