Zhen-Long Chen

Title: Zhen-Long Chen: Innovator in Trench Profile Monitoring

Introduction

Zhen-Long Chen is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of spectrometrologic analysis, particularly in monitoring trench profiles of substrates. His innovative approach has led to the development of a unique apparatus that enhances the accuracy of trench profile measurements.

Latest Patents

Zhen-Long Chen holds a patent for an "Apparatus and method for monitoring trench profiles and for spectrometrologic analysis." This apparatus utilizes a radiation-emitting unit to irradiate a substrate with infrared radiation. The reflected infrared radiation is measured at various frequencies, allowing for the determination of reflectance and phase changes. By performing a Fourier transformation, a secondary Fourier spectrum is obtained, which helps identify reflective planes within the substrate. This method enables the identification of rough sections in trench profiles without the need for complex modeling.

Career Highlights

Throughout his career, Zhen-Long Chen has worked with prominent companies such as Infineon Technologies AG and Nan Ya Technology Corporation. His experience in these organizations has contributed to his expertise in the field of trench profile monitoring and spectrometrologic analysis.

Collaborations

Zhen-Long Chen has collaborated with esteemed colleagues, including Peter Weidner and Pierre-Yves Guittet. These collaborations have further enriched his work and have led to advancements in the technologies he has developed.

Conclusion

Zhen-Long Chen is a distinguished inventor whose work in trench profile monitoring has made a significant impact in the field of spectrometrologic analysis. His innovative patent and collaborations with industry leaders highlight his contributions to advancing technology.