Location History:
- Santa Clara, CA (US) (2015)
- Fremont, CA (US) (2020)
Company Filing History:
Years Active: 2015-2020
Title: Innovations of Zhefeng Li in Thin Film Material Deposition
Introduction
Zhefeng Li is a notable inventor based in Fremont, CA, who has made significant contributions to the field of thin film material deposition. With a total of 2 patents, his work focuses on advanced methods that enhance the efficiency and effectiveness of material deposition processes.
Latest Patents
Zhefeng Li's latest patents include innovative methods for thin film material deposition using reactive plasma-free physical vapor deposition. These methods involve depositing a thin film of compound material on a substrate by flowing a reactive gas into a plasma processing chamber. The process includes exciting the reactive gas into a plasma to react with a sputter target, forming a first layer of compound material. An inert gas is then introduced to sputter a second layer of the compound material onto the substrate. This cycle can be repeated to achieve the desired thickness of the compound material layer. Another significant patent describes methods for depositing manganese and manganese nitrides, which enhance copper barrier properties through doping with various elements.
Career Highlights
Zhefeng Li is currently employed at Applied Materials, Inc., where he continues to innovate in the field of material science. His work has been instrumental in developing new techniques that improve the quality and performance of thin films used in various applications.
Collaborations
Zhefeng has collaborated with notable coworkers, including Jing Tang and Paul F Ma, contributing to a dynamic research environment that fosters innovation and development.
Conclusion
Zhefeng Li's contributions to the field of thin film material deposition are noteworthy and reflect his commitment to advancing technology. His patents demonstrate a deep understanding of material science and its applications in modern technology.