The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Apr. 11, 2013
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Jing Tang, Cupertino, CA (US);
Zhefeng Li, Santa Clara, CA (US);
Paul F. Ma, Santa Clara, CA (US);
David Thompson, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); C23C 16/34 (2006.01); H01L 21/285 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76843 (2013.01); C23C 16/34 (2013.01); H01L 21/28556 (2013.01); H01L 21/28562 (2013.01); H01L 23/53238 (2013.01); H01L 21/76846 (2013.01); H01L 21/76856 (2013.01); H01L 21/76862 (2013.01); H01L 21/76867 (2013.01);
Abstract
Described are manganese-containing films, as well as methods for providing the manganese-containing films. Doping manganese-containing films with Co, Mn, Ru, Ta, Al, Mg, Cr, Nb, Ti or V allows for enhanced copper barrier properties of the manganese-containing films. Also described are methods of providing films with a first layer comprising manganese silicate and a second layer comprising a manganese-containing film.