Zhefei J Chen

Title: Zhefei J Chen: Innovator in Chemical-Mechanical Planarization

Introduction

Zhefei J Chen is a notable inventor based in Los Altos, CA (US). He has made significant contributions to the field of chemical-mechanical planarization, particularly in the development of compositions and methods that enhance substrate processing. With a total of 4 patents to his name, Chen's work is recognized for its innovative approach to substrate surface treatment.

Latest Patents

Chen's latest patents focus on compositions for chemical-mechanical planarization of noble-metal-featured substrates. One of his notable inventions includes a composition that comprises periodic acid and an abrasive, which is present in a combined amount sufficient to planarize a substrate surface featuring noble metals, noble metal alloys, or noble metal oxides. The composition is designed to optimize the pH levels, ensuring effective planarization. Another patent details a method for planarizing a substrate surface using a slurry that includes periodic acid and an abrasive, highlighting the practical applications of his research in the industry.

Career Highlights

Throughout his career, Zhefei J Chen has worked with prominent companies such as Lam Research Corporation and Da Nanomaterials LLC. His experience in these organizations has allowed him to refine his expertise in chemical-mechanical planarization and contribute to advancements in substrate processing technologies.

Collaborations

Chen has collaborated with notable professionals in his field, including Robert J Small and Sabir A Majumder. These collaborations have further enriched his research and development efforts, leading to innovative solutions in substrate treatment.

Conclusion

Zhefei J Chen's contributions to the field of chemical-mechanical planarization are significant and impactful. His innovative patents and career achievements reflect his dedication to advancing technology in substrate processing.