This inventor holds 1 USPTO granted patent. Top assignee: Dalian University of Technology. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: Innovations of Zhe Li in Reentry Trajectory Planning
Introduction
Zhe Li is an accomplished inventor based in Dalian, China. He has made significant contributions to the field of aerospace engineering, particularly in the area of reentry trajectory planning for aircraft. His innovative approach has led to the development of a unique method that enhances the efficiency and safety of reentry maneuvers.
Latest Patents
Zhe Li holds a patent for a "Method for directly planning reentry trajectory in height-velocity profile." This method involves several key steps. First, it extracts actual working parameters of an aircraft and sets maximum values for stagnation point heat flux, dynamic pressure, and overload based on mission requirements. Next, it solves the height-velocity boundary of the reentry trajectory, determining the lower boundary in the height-velocity profile. Finally, it plans a trajectory that satisfies terminal constraints and calculates the corresponding bank angle to obtain the reentry trajectory.
Career Highlights
Zhe Li is affiliated with Dalian University of Technology, where he continues to advance his research and innovations. His work has garnered attention for its practical applications in aerospace technology. With a focus on improving reentry procedures, he has positioned himself as a key figure in this specialized field.
Collaborations
Zhe Li collaborates with notable colleagues, including Wenya Zhou and Zhentao Nie. These partnerships enhance the research environment and foster innovative solutions in their projects.
Conclusion
Zhe Li's contributions to reentry trajectory planning demonstrate his expertise and commitment to advancing aerospace engineering. His innovative methods are paving the way for safer and more efficient reentry processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile