Beijing, China

Zhaolei Li

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Boe Technology Group Co., Ltd., Ordos Yuansheng Optoelectronics Co., Ltd.. Active years: 2020.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Zhaolei Li: Innovator in Backlight Source Technology

Introduction

Zhaolei Li is a prominent inventor based in Beijing, China. He has made significant contributions to the field of optical technology, particularly in backlight source monitoring devices. His innovative approach has led to the development of a unique patent that enhances the efficiency of backlight source testing.

Latest Patents

Zhaolei Li holds a patent for a "Backlight source testing device and light-on testing apparatus." This invention provides a backlight source monitoring device and a pattern generator. The device includes a base, a fixing structure to secure the backlight source, a monitoring element to measure brightness values, and a display element to present the obtained brightness data. This invention is crucial for improving the accuracy and reliability of backlight source testing.

Career Highlights

Throughout his career, Zhaolei Li has worked with notable companies such as BOE Technology Group Co., Ltd. and Ordos Yuansheng Optoelectronics Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in optical technologies.

Collaborations

Zhaolei Li has collaborated with talented individuals in his field, including Tuan Liang and Shuanghui Zhao. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Zhaolei Li's contributions to backlight source technology exemplify his dedication to innovation and excellence. His patent and career achievements highlight his role as a key figure in the advancement of optical technology.

Profile summary based on public USPTO records.
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