Brno, Czechia

Zbynek Oseljsek

This inventor holds 1 USPTO granted patent. Top assignee: Honeywell International Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zbynek Oseljsek. Retrieved from https://idiyas.com/inventor/zbynek-oseljsek

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Zbynek Oseljsek: Innovator in Radial Compressor Technology

Introduction

Zbynek Oseljsek is a notable inventor based in Brno, Czech Republic. He has made significant contributions to the field of compressor technology, particularly with his innovative designs that enhance efficiency and performance.

Latest Patents

Oseljsek holds a patent for a multistage radial compressor baffle. This invention includes a first radial compressor wheel with a hub surface featuring an annular ridge. It also incorporates a second radial compressor wheel and an annular baffle positioned between the hub surfaces. The design aims to optimize airflow and improve the overall functionality of radial compressors.

Career Highlights

Zbynek Oseljsek is currently employed at Honeywell International Inc., where he continues to develop cutting-edge technologies. His work focuses on enhancing compressor systems, which are vital in various industrial applications.

Collaborations

Throughout his career, Oseljsek has collaborated with talented professionals such as Vaclav Kares and Vit Houst. These partnerships have contributed to the advancement of innovative solutions in the field of compressor technology.

Conclusion

Zbynek Oseljsek's contributions to radial compressor technology exemplify his commitment to innovation and efficiency. His patent and ongoing work at Honeywell International Inc. highlight his role as a key figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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