Zaki Saleh

Title: Innovations by Zaki Saleh in Dry Cleaning Process Chambers

Introduction

Zaki Saleh is an accomplished inventor based in Newbury Park, California. He has made significant contributions to the field of chemical vapor deposition (CVD) through his innovative patent. His work focuses on improving the efficiency and effectiveness of dry cleaning process chambers.

Latest Patents

Zaki Saleh holds a patent for "Systems and methods for dry cleaning process chambers." This patent highlights the use of chlorine trifluoride (ClF) as a superior chemistry for in-situ cleaning of process equipment used in CVD of metals. ClF is a weakly-bound molecule that reacts exothermically with hot conducting films such as titanium (Ti) and titanium nitride (TiN) without the need for plasma. This unique property gives ClF an advantage over other cleaning chemistries. The energy released during the reaction is utilized to volatize the byproducts of the reaction. However, cooler reactor surfaces may be coated with a halogen-rich, less conductive film that is less reactive with ClF. To enhance the ClF reaction, additives like nitrous dioxide are employed, which supply reactive ions that are energetic enough to volatize the byproducts.

Career Highlights

Zaki Saleh is currently employed at Tokyo Electron Limited, where he continues to innovate and develop new technologies in the field of semiconductor manufacturing. His expertise in chemical processes has made him a valuable asset to the company.

Collaborations

Zaki has collaborated with Richard A Comunale, a fellow professional in the industry. Their combined efforts have contributed to advancements in the field of chemical vapor deposition and related technologies.

Conclusion

Zaki Saleh's innovative work in the area of dry cleaning process chambers demonstrates his commitment to advancing technology in the semiconductor industry. His patent for using chlorine trifluoride showcases the potential for improved efficiency in chemical processes.