This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Centre National De La Recherche Scientifique. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Zahia Bougrioua: Innovator in III-Nitride Substrate Production
Introduction
Zahia Bougrioua is a prominent inventor based in Nice, France. She has made significant contributions to the field of materials science, particularly in the production of self-supporting substrates comprising III-nitrides. Her innovative work has led to the development of a patented method that enhances the efficiency and quality of these substrates.
Latest Patents
Zahia Bougrioua holds a patent for a method of producing self-supporting substrates comprising III-nitrides by means of heteroepitaxy on a sacrificial layer. This invention focuses on the production of self-supporting substrates that include gallium nitride (GaN). The method involves depositing a single-crystal silicon-based intermediary layer that is designed to be vaporized during the III-nitride epitaxy step. This innovative approach allows for the creation of flat, self-supporting III-nitride layers with diameters greater than 2 inches. She has 1 patent to her name.
Career Highlights
Zahia Bougrioua is affiliated with the Centre National de la Recherche Scientifique, where she conducts her research and development activities. Her work has been instrumental in advancing the understanding and application of III-nitride materials in various technological fields.
Collaborations
Zahia has collaborated with notable colleagues, including Eric Pascal Feltin and Gilles Nataf. These partnerships have contributed to the success and impact of her research in the scientific community.
Conclusion
Zahia Bougrioua is a trailblazer in the field of III-nitride substrate production, with her patented methods paving the way for advancements in materials science. Her contributions continue to influence the development of innovative technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
